Two-dimensional (2D) materials, and in particular Transition Metal Dichalcogenides (TMDs), have attracted significant interest as potential alternatives to silicon for future nanoelectronic and optoelectronic technologies, thanks to their unique electronic and optical properties. However, the practical implementation of TMDs in functional devices remains limited by several challenges, including the scalable synthesis of high-quality homogeneous films, the ability to pattern these materials with nanoscale precision, and the development of reliable, controllable doping strategies. This PhD work addresses these issues by exploring low-temperature deposition of large-area TMD films via Ion Beam Sputtering (IBS) and subsequent possibility to induce recrystallization via high-temperature processes. In parallel, it introduces thermal Scanning Probe Lithography (t-SPL) as a novel and minimally invasive nanofabrication technique, capable of locally tuning the optoelectronic properties of TMDs with high spatial resolution. The results presented here offer new perspectives for the integration of 2D materials into scalable, next-generation device architectures.

Scalable and Deterministic Nanofabrication of Hybrid 2D Transition Metal Dichalcogenide Layers for Light Manipulation and Energy Harvesting

ZAMBITO, GIORGIO
2025

Abstract

Two-dimensional (2D) materials, and in particular Transition Metal Dichalcogenides (TMDs), have attracted significant interest as potential alternatives to silicon for future nanoelectronic and optoelectronic technologies, thanks to their unique electronic and optical properties. However, the practical implementation of TMDs in functional devices remains limited by several challenges, including the scalable synthesis of high-quality homogeneous films, the ability to pattern these materials with nanoscale precision, and the development of reliable, controllable doping strategies. This PhD work addresses these issues by exploring low-temperature deposition of large-area TMD films via Ion Beam Sputtering (IBS) and subsequent possibility to induce recrystallization via high-temperature processes. In parallel, it introduces thermal Scanning Probe Lithography (t-SPL) as a novel and minimally invasive nanofabrication technique, capable of locally tuning the optoelectronic properties of TMDs with high spatial resolution. The results presented here offer new perspectives for the integration of 2D materials into scalable, next-generation device architectures.
29-mag-2025
Inglese
Italiano
BUATIER DE MONGEOT, FRANCESCO
GIORDANO, MARIA CATERINA
TOSI, SILVANO
Università degli studi di Genova
File in questo prodotto:
File Dimensione Formato  
phdunige_4397999.pdf

accesso aperto

Dimensione 13.76 MB
Formato Adobe PDF
13.76 MB Adobe PDF Visualizza/Apri

I documenti in UNITESI sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14242/212407
Il codice NBN di questa tesi è URN:NBN:IT:UNIGE-212407