In this work, we present a comprehensive approach to nanopore fabrication by developing and implementing two complementary methods: a plasmonic photochemistry process for metallic nanopores and a versatile scheme for conical dielectric nanopores. The motivation for this research stems from the increasing demand for highly controlled nanostructures for DNA data storage and single-molecule sensing, where precise size control and robust architectures are crucial. We demonstrate that plasmonic photochemistry can be applied to precisely tailor the diameter of metallic nanopore arrays via a localized photochemical reaction. By exploiting the enhanced electromagnetic fields in plasmonic nanostructures, we achieve a controllable pore reduction down to the nanoscale, allowing for optimized detection of single entities such as DNA and nanoparticles. This method offers a scalable and flexible alternative to conventional nanopore fabrication techniques. Furthermore, we establish a novel fabrication scheme for conical 3D nanopores using dielectric oxides. This technique enables the production of conical nanopores with various geometries, achieving fine-tuned control over size, shape, and surface properties. We demonstrate their functionality in multiple applications, including ionic current rectification, memristive behavior, and biomolecular detection. The ability to engineer nanopores from high-index dielectric materials expands their potential use in optoelectronics and nanoscale ion transport. Moreover, adding a metallic layer onto these structures, they function as plasmonic antennas for enhanced optical techniques. Together, these advancements represent a significant step forward in the field of solid-state nanopores, offering a highly versatile platform with broad implications in nanofluidics, biosensing, sequencing technologies, and molecular electronics. Our findings highlight the applicability and adaptability of these fabrication techniques, paving the way for future integration into next-generation nanodevices.

Customized 3D Nanopore Fabrication for Advanced Electrical and Optical Applications

LANZAVECCHIA, GERMAN
2025

Abstract

In this work, we present a comprehensive approach to nanopore fabrication by developing and implementing two complementary methods: a plasmonic photochemistry process for metallic nanopores and a versatile scheme for conical dielectric nanopores. The motivation for this research stems from the increasing demand for highly controlled nanostructures for DNA data storage and single-molecule sensing, where precise size control and robust architectures are crucial. We demonstrate that plasmonic photochemistry can be applied to precisely tailor the diameter of metallic nanopore arrays via a localized photochemical reaction. By exploiting the enhanced electromagnetic fields in plasmonic nanostructures, we achieve a controllable pore reduction down to the nanoscale, allowing for optimized detection of single entities such as DNA and nanoparticles. This method offers a scalable and flexible alternative to conventional nanopore fabrication techniques. Furthermore, we establish a novel fabrication scheme for conical 3D nanopores using dielectric oxides. This technique enables the production of conical nanopores with various geometries, achieving fine-tuned control over size, shape, and surface properties. We demonstrate their functionality in multiple applications, including ionic current rectification, memristive behavior, and biomolecular detection. The ability to engineer nanopores from high-index dielectric materials expands their potential use in optoelectronics and nanoscale ion transport. Moreover, adding a metallic layer onto these structures, they function as plasmonic antennas for enhanced optical techniques. Together, these advancements represent a significant step forward in the field of solid-state nanopores, offering a highly versatile platform with broad implications in nanofluidics, biosensing, sequencing technologies, and molecular electronics. Our findings highlight the applicability and adaptability of these fabrication techniques, paving the way for future integration into next-generation nanodevices.
28-mag-2025
Inglese
TOSI, SILVANO
Università degli studi di Genova
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14242/212411
Il codice NBN di questa tesi è URN:NBN:IT:UNIGE-212411